KPFM visualisation of the Schottky barrier at the interface between gold nanoparticles and silicon
Résumé
Gold nanoparticles (AuNPs) deposited on a doped silicon substrate induce a local band bending and a local
accumulation of positive charges in the semiconductor. Unlike the case of planar gold-silicon contacts, working with
nanoparticles results in reduced values for the built-in potential and lower Schottky barriers. Here, AuNPs of 55 nm diameter
were deposited on several silicon substrates that were previously functionalized with aminopropyltriethoxysilane (APTES).
The samples are characterized by Scanning Electronic Microscope (SEM) and the nanoparticle surface density is assessed
with dark-field optical microscopy. A density of 0.42 NP/μm² was measured. Kelvin Probe Force Microscopy (KPFM) is used
to measure the contact potential differences (CPD). The CPD images exhibit a ring-shape pattern (“doughnut-shape”)
centred on each AuNP. The built-in potential is measured at +34 mV for n-doped subtrates and decreases to +21 mV for pdoped
silicon. These effects are discussed using the classical electrostatic approach.
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