A3 Physical vapor deposition processes Chemical and biological sensors Carbon nanotubes Structure Plasmas froids Applications industrielles Alzheimer's disease Aluminium nitride Vanadium Sesquioxide Semiconductors Transmission electron microscopy CIGSe Biofilms microbiens Mott insulators Buffer Couple Sol-gel Physical vapor deposition B2 Semiconducting indium compounds B2 Quaternary CH4 AlN Chalcogenide B1 Inorganic compounds Adsorption Calcined clay Copper Transfert d'énergie Atomic layer etching Avalanche breakdown Functionalization B Chemical synthesis Magnetron sputtering Oxides Atomic force microscopy NEXAFS Bixbyite Films Band gap Residual stress Spectroscopic ellipsometry 3 nm in size Scanning electron microscopy Band alignment PECVD A Chalcogenides Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Capacitance BOMBARDMENT X-ray diffraction Non-volatile memory Alloying B2 Semiconducting alloys Selenization Nanotubes Thin films Cathepsin Nanocomposite Aryl-diazonium salts A-CNx Amyloid precursor V2O3 Sputtering Carbon nitride Chalcogenides Chalcogenide glass Carbon Nanotube C Photoelectron spectroscopy X-ray photoelectron spectroscopy Biomasse Ambipolar material A Thin films CaTiO3Pr^3^+ Optical properties Ablation laser B3 Solar cells Carbon CNTs’ collapse Low-pressure plasma processing TiO2 Kirkendall effect AZO thin films Etching Bipolar resistive switching BRS Colloidal solution SF 6 Anatase Biocapteurs AuCu alloy A1 Characterization XPS TEM Plasma etching Mott insulator Thin film CHLORINE PLASMAS Amorphous Chemical detection A Multilayers Titanium dioxide Resistive switching