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Lithographie par auto-assemblage d'origami d'ADN

Abstract : The nanoscience and nano technology development determine the continual device miniaturization. Until now, lithography has been the main driving force of this process, but reaches its resolution limits. In this context and to meet future technological requirements, new patterning techniques will have to be considered. Due to its nanometric size (diameter of 2 nm), its capacity for self-assembly, its structural diversity and the possibilities of functionalization, DNA constitutes a promising approach making it possible to push back the limits of resolution obtained by photolithography processes. In particular, it offers the possibility of creating 2D and 3D architectures, defined to the nearest nanometer. DNA origami based lithography have become of great interest for highresolution patterning due to of their facility, elegance and high throughput. Self-assembling materials used in conjunction with the most advanced exposure tools may enable extension of current manufacturing practices to dimensions of 10 nm and less.This thesis work demonstrates the feasibility of nano-structuring the surface of a silicon substrate from a DNA origami mask. It aims at a sub-10 nm resolution, a pattern density compatible with microelectronic applications, but also the realization of complex self-aligned structures.The studies carried out during this work focused on two axes. We were first interested in etching processes and their characterization, allowing the transfer of sub-10 nm motifs from an origami DNA mask. A second area of work focused on the individual positioning of these structures. For this, we have implement a new nano-patterning hybrid process by combining conventional lithography and self-assembly of DNA origami. By locally controlling the surface properties we managed the placement of single DNA origami on the substrate, in order to integrate them into functional devices.
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Submitted on : Wednesday, January 19, 2022 - 10:42:08 AM
Last modification on : Friday, March 25, 2022 - 9:40:55 AM
Long-term archiving on: : Wednesday, April 20, 2022 - 6:19:21 PM


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  • HAL Id : tel-03533984, version 1




Marie Marmiesse. Lithographie par auto-assemblage d'origami d'ADN. Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes [2020-..], 2021. Français. ⟨NNT : 2021GRALT017⟩. ⟨tel-03533984⟩



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