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Plasma etching of high-χ block copolymers

Abstract : For the sub-10 nm technologic nodes, conventional lithography has achieved its limit in terms of pattern scaling and new patterning techniques are being studied to continue the miniaturization of the transistor’s dimensions. In this PhD, we have focused on the directed self-assembly (DSA) of block copolymers, which is a promising low-cost solution to obtain high density sub-10 nm patterns. Two of the most important aspects of the DSA technology are the orientation control of the block copolymer, in order to obtain the line patterns aligned in long range order, and the removal of one block selectively to the other before pattern transfer. Therefore, in Chapter III, we have evaluated and optimized the different etching steps of the Arkema-CEA (ACE) chemo-epitaxy alignment flow, namely regarding their impact on the block copolymer alignment and defectivity. The results obtained allowed us to align a PS-b-PMMA block copolymer in line/space patterns without any type of alignment or lift-off defects, which translates to 0 defects/100 μm². In Chapters IV and V, we have studied the plasma etching of high-χ block copolymers, which present a smaller pitch due to a stronger microphase segregation between the blocks. Two types of high-χ block copolymers were studied, one purely organic (modified PS-b-PMMA) and the other silicon-containing (PS-b-PDMSB), both presenting a pitch of 18 nm and a CD of 9 nm. For both block copolymers, we have developed different plasma etching approaches to selectively remove one phase while conserving enough budget of the other block in order to transfer the line/space patterns. Using these approaches, the pattern transfer into different underlayers is demonstrated for both high-χ block copolymers.
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Submitted on : Thursday, January 13, 2022 - 8:59:07 AM
Last modification on : Friday, March 25, 2022 - 9:40:55 AM
Long-term archiving on: : Thursday, April 14, 2022 - 6:16:28 PM


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  • HAL Id : tel-03524057, version 1




Maria Gusmao Cacho. Plasma etching of high-χ block copolymers. Micro and nanotechnologies/Microelectronics. Université Grenoble Alpes [2020-..], 2021. English. ⟨NNT : 2021GRALT056⟩. ⟨tel-03524057⟩



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